| Tuesday, March 18 | |
| 7:00 am | Registration |
| 8:45 | Welcome and Awards |
| 9:00 | Industry Keynote: The Perils of Passives Going Green; John Maxwell, Vice President Engineering, Johanson Dielectrics |
| 9:30 | Session 1: Passive Components for Harsh Applications |
Invited Paper |
Recent Trends and Developments in Passive Component EMI Filters for Active Implantable Medical Devices; (view abstract) |
1.1 |
Capacitor Selection in Aviation Equipment; |
1.2 |
Aluminum Oxynitride Capacitors for Multilayer Devices with Higher Energy Density and Wide Temperature Properties; K. Bray, K Systems Corp. (view abstract) |
1.3 |
Diamond-Like Carbon Capacitor for High Energy Density and High Temperature Operation; S. Carr, U.S. Air Force (view abstract) |
1.4 |
Hybrid Capacitor Assembly Qualification; |
1.5 |
Aluminium Electrolytic Capacitors' Performance in Very High Ripple Current and Temperature Applications; L. Eliasson, Evox Rifa AB (view abstract) |
| 12:00 pm | Lunch with Exhibits |
| 2:00-5:15pm | Session 2: Designing for Computer and Consumer Applications |
Invited Paper |
Power Delivery Challenges for Multi-Core Microprocessors; (view abstract) |
2.1 |
Tantalum Capacitor Benchmark in Audio Portable Applications; R. Faltus, T. Zednicek, AVX Czech Republic; I. Smith, Wolfson Microelectronics plc (view abstract) |
2.2 |
Efficient, Stable, and Reliable Tantalum Capacitors; Y. Freeman, P. Lessner, Kemet Electronics (view abstract) |
2.3 |
Decoupling Solutions; J. Prymak, E. Reed, R. Hahn, M. Randall, P. Blais, B. Long, Kemet Electronics (view abstract) |
2.4 |
Battle for Volumetric Efficiency: When Technologies Compete Customers Win; R. Hahn, Kemet Electronics (view abstract) |
2.5 |
Film Capacitor Thermal Strategies Increase Power Density; |
2.6 |
Advanced Multilayer Capacitors Using High Energy Density Antiferroelectric Ceramics; W. Hackenberger, TRS Technologies Inc. (view abstract) |
| 5:30 - 7:30 pm | Exhibits and Reception |
| Wednesday, March 19 | |
| 7:00 am | Registration |
| 8:30 | Session 3: Unique Electronic Design Approaches |
Invited Paper |
Role of Wireless Modules, Using Embedded Passives, in The Expansion of Wirelss Connectivity Solutions ; (view abstract) J. Kolbe, Murata North America |
3.1 |
Why That 47 uF Capacitor Drops to 37 uF, 30 uF, or Lower; J. Prymak, M. Randall, P. Blais, B. Long, Kemet Electronics (view abstract) |
3.2 |
The Growing Importance of Inductance in Tantalum Capacitors; E. Reed, KEMET Electronics (view abstract) |
3.3 |
Printable Film Sensors; |
3.4 |
Fabrication and Characterization of Nanolayer Capacitors; R. Chow, LLNL (view abstract) |
3.5 |
High Voltage Solid Polymer Tantalum Capacitors; J. Young, J. Qiu, R. Hahn, Kemet Electronics (view abstract) |
3.6 |
Electrochemical Reactions on Graphite Cathodes in High-Voltage Capacitors; J. Hossick-Schott, Medtronic Energy and Components (view abstract) |
12:00 pm |
Lunch with Exhibits |
| 2:00 - 5:00 pm | Session 4: Advanced Testing and Reliability |
Invited Paper |
Process Development with Temperature Sensitive Components in Server Applications; (view abstract) L. Pymento, W. Davis, M. Kelly, M. Cole, J. Wilcox, P. Krystek, C. Grosskopf, IBM Corp. |
4.1 |
An Advanced Test Solution for Relay Stick, Miss, and Functional Testing, Reflex 40 ; S.J. Hobday, Applied Relay Testing Ltd. (view abstract) |
4.2 |
Effect of Surge Current Testing on Performance and Reliability of Solid Tantalum Capacitors; A. Teverovsky, Perot Systems/GSFC (view abstract) |
4.3 |
Construction improvement for anti-sulfuration chip resistors; |
4.4 |
Niobium Oxide and Tantalum Capacitors: Leakage Current, Restoring Voltage and Reliability; J. Sikula, V. Sedlakova, H. Navarova, J. Hlavka, Brno University; M. Tacano, Meisei University; Z. Sita, AVX Czech Republics (view abstract) |
4.5 |
Shorting Failure in High Voltage Ceramic Capacitor with Floating Internal Electrode Structure; Y. Deng, Huawei Technologies Co. Lt (view abstract) |
| Thursday, March 20 | |
| 7:00 am | Registration |
| 9:00 | Session 5: New Technology and Manufacturing Processes |
5.1 |
Complexities In The Deposition of Thin Film Resistors; |
5.2 |
Dielectric Improvement in NbO Capacitors; Z. Sita, AVX Czech Republic (view abstract) |
5.3 |
New Polymer Dielectric For High Energy Density Film Capacitors; |
5.4 |
Dispersed Spherical Silver Particles for Electronic Applications; |
5.5 |
Process and Quality Improvement of Pastes and Inks Using Mazerustar; G. Hemphill, Technic Inc. (view abstract) |
5.6 |
Inkjet Printing of Silver Nanoparticles for Electronic Applications ; K. Balantrapu, M. McMurran, D. Goia, Clarkson University (view abstract) |
| 12:00 pm | Lunch |
| 1:00 | Session 6: Advancements in Processes & Materials |
6.1 |
Mass Production Techniques for Chip Resistors; |
6.2 |
Growing Importance of Polyalkylene Carbonate Binders for the Passive Component Industry; P. Ferraro, Empower Materials (view abstract) |
6.3 |
Multilayer Polymer Aluminum Electrolytic Capacitors with Polypyrrole as Cathode Materials; K. Zhang, Fujian Guoguang Electronics (view abstract) |
6.4 |
Use of Amorphous Oxides as High Temperature Dielectric Material in Wound Capacitors; K. Jamison, R. Wood, G. Zollars, Nanohmics Inc.; M. Kordesch, Ohio University (view abstract) |
6.5 |
Advances in Class-I C0G MLCC and SMD Film Capacitors; |